Effects of Etching Parameters on Chemical Etching of Aluminum

Abstract

The purpose of the present work was to examine alternative etching conditions of aluminum. The effects of etching solution type, solution concentration, temperature, time and acid addition on the etching behavior for aluminum has been investigated. Depth of etch and etch rate values were measured by using 0-150 mm electronic digital caliper. Mitutoyo SJ-301 equipment was used for analyzing the surface of the aluminum. The effects of selected chemical etching parameters on depth of etch and surface finish quality were investigated. The best etching results were obtained by using FeCl₃ solution but the surface quality with this solution had to be improved. Also it was concluded that the concentration and the temperature of the etchant, etching time and acid additive parameters have important effects on aluminum surface quality.

Key words: Aluminum alloys, surface treatments, selection of material processes.