Characterization of Plasma Polymerized Polyaniline Thin Films

Abstract

In this study, it is aimed to obtain polymeric thin films derived from Aniline, which is an organic compound. The glass substrates were placed in the vacuum chamber after washing and cleaning in organic solvent, hot distilled water, and ultrasonic bath respectively. After depressurizing the vacuum chamber to 100 mTorr by means of vacuum pump, vacuum chamber pressure was fixed and power of RF source designed as 20 Watt whilst thin films were obtained. Molecular structure, amorphous phase, optical and surface morphology characteristics of obtained thin films were researched by using respectively FTIR, XRD, UV-VIS spectroscopes and SEM. It was revealed that thin films, obtained as a result of the process of characterization, have highly cross linked, amorphous structured and semiconducting properties. The thickness of the films was found to be 240 nm by Ellipsometry. The deposition rate was found to be 4 nm/min. It is believed that, obtained thin films have the potential of being used in semiconducting tools industry considering the energy-gap