Analysis of Chemically Deposited Copper Sulphide Thin Films
Abstract
Thin films of Copper Sulphide (CuS) have been fabricated by chemical bath deposition (CBD) technique on glass substrates at room temperature .The structural, morphological and optical properties were investigated. The samples used for XRD and SEM studies were found to be amorphous for the as- deposited and annealed (573k). Film thickness was found to depend on molar concentration of complexing agent. Spectrophotometric analysis of the as- deposited films revealed peak values of 96.30%, 52.97% and 76.09% respectively for absorbance, transmittance, and reflectance respectively. Average values of refractive index (n) ranged between 1.18 and 2.47.Optical band gap values for the films are in the range 2.30eV and 2.44eV. Films could find applications in devices for photovoltaic conversion of solar energy, as window coatings and gas sensors.
Keywords: Copper sulphide, chemically deposited, band gap, thin film
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ISSN (Paper)2224-3224 ISSN (Online)2225-0956
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