Study of the Effects of Thermal Annealing on the Optical Band Gap of Nanocrystalline CoO Thin Films Prepared by Chemical Bath Deposition.

D.U Onah, C. E. Okeke, R. U. Osuji, B. A. Ezekoye, J. E. Ekpe, G. F. Ibeh A, B. C. Ekwealor, F. I. Ezema

Abstract


Nanocrystalline films of cobalt oxide have been prepared on glass slides by chemical bath deposition process. For deposition of CoO thin films, cobaltous chloride [CoCl2.6H2O] was used as cationic and ammonia [NH3] as anionic precursor in aqueous medium. In this process NaOH was used as complexing agent. X-ray diffraction, scanning electron microscopic [SEM] analysis have been used to study the films’ crystal structures, optical and solid state properties. We hereby present the effects of thermal annealing on the optical band gap of CoO thin films. The optical transition in the films is direct one. For the as- deposited film, the band gap is 2.1eV. This later decreased to 2.08eV, so that increased thermal annealing reduces the optical band gap of CoO. However,the energy gap cannot be said to be dependent on the annealing temperatures. These films could be used as  photovoltaic cells, sensors light emitting diodes and also in biomedical imaging.

Key Words: Nanocrystalline CoO, Chemical Bath Deposition, Band Gap and                               Thermal Annealing.


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ISSN (Paper)2224-3224 ISSN (Online)2225-0956

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